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Aluminum oxide (Al2O3) sputtering target, evaporation material,CAS 1344-28-1

Categories Sputtering Targets
Brand Name: TYR
Model Number: Al2O3
Place of Origin: CHINA
MOQ: 1 piece
Price: USD$200 per piece
Payment Terms: T/T, Western Union
Supply Ability: 100 piece per month
Delivery Time: 10-30 work days
Packaging Details: vacuum packing with bag per piece
Material: Aluminum oxide
Color: white
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    Aluminum oxide (Al2O3) sputtering target, evaporation material,CAS 1344-28-1

    Aluminum oxide (Al2O3) sputtering targets


    Purity: 99.99%


    Shape: Discs, disks, step disk, delta, plate, sheets or made per drawing


    Diameter: 355.6mm (14") max.


    Single piece Size: Length: <500mm, Width: <250mm, Thickness: >1mm, if larger size than this, we can do it as Tiles joint by 45 degree or 90 degree


    Made sputtering targets method: hot pressing (HP), hot/cold isostatic pressing (HIP, CIP), and vacuum melting, vacuum sintering


    Density 3.95–4.1 g/cm3 , Melting point 2072 °C (3,762 °F; 2,345 K), Boiling point 2977 °C (5,391 °F; 3,250 K), Solubility in water insoluble

    Al2O3 is an electrical insulator but has a relatively high thermal conductivity (30 Wm−1K−1) for a ceramic material. Aluminum oxide is completely insoluble in water. In its most commonly occurring crystalline form, called corundum or α-aluminum oxide, its hardness makes it suitable for use as an abrasive and as a component in cutting tools.

    Aluminum oxide is responsible for the resistance of metallic aluminum to weathering. Metallic aluminum is very reactive with atmospheric oxygen, and a thin passivation layer of aluminum oxide (4 nm thickness) forms on any exposed aluminum surface. This layer protects the metal from further oxidation. The thickness and properties of this oxide layer can be enhanced using a process called anodizing. A number of alloys, such as aluminum bronzes, exploit this property by including a proportion of aluminum in the alloy to enhance corrosion resistance. The aluminum oxide generated by anodizing is typically amorphous, but discharge assisted oxidation processes such as plasma electrolytic oxidation result in a significant proportion of crystalline aluminum oxide in the coating, enhancing its hardness.

    Applications: Filler, Catalysis, Purification, Abrasive, Paint, electrical insulator
    The great majority of aluminum oxide is consumed for the production of aluminum, usually by the Hall process.
    Using a plasma spray process and mixed with titania, it is coated onto the braking surface of some aluminium bicycle rims to provide abrasion and wear resistance
    Charged Aerosol Release Experiment (CARE) , Corundum , List of alumina refineries , Micro-Pulling-Down , Ruby , Sapphire , Transparent alumina


    We also supply below oxie ceramic sputtering targets material:


    Aluminum Oxide Al2O3 target Aluminum Zinc Oxide Al2O3-ZnO Al-ZnO target

    Antimony Oxide Sb2O3 target Antimony Tin Oxide Sb2O3-SnO ATO target

    Chromium Oxide Cr2O3 target Copper Oxide CuO, Cu2O target

    Cerium Oxide CeO2 Target Cobalt Oxide target CoO, Co2O3, Co3O4 target

    Dysprosium Oxide Dy2O3 target Europium Oxide Eu2O3 target

    Erbium Oxide Er2O3 target Germanium Oxide GeO2 target

    Gadolinium Oxide Gd2O3 target Gallium Oxide Ga2O3 target

    Hafnium Oxide HfO2 target Hafnium Yttrium Oxide HfO2-Y2O3 target

    Holmium Oxide Ho2O3 target Iron Oxide Fe2O3, Fe3O4 target

    Indium Oxide In2O3 target Indium Zinc Oxide, In2O3-ZnO target

    Indium Zinc Gallium Oxide In2O3-ZnO-Ga2O3, IZGO target

    Indium Gallium Oxide In2O3-Ga2O3, IGO target

    Indium Tin Oxide In2O3-SnO2, ITO target Lanthanum Oxide La2O3 target

    Lutetium Oxide Lu2O3 target Magnesium Oxide MgO target

    Molybdenum Oxide MoO3 target Manganese Oxide MnO2,MnO target

    Nickel Oxide NiO target Niobium Oxide Nb2O5, Nb2Ox target

    Neodymium Oxide Nd2O3 target Praseodymium Oxide Pr6O11 target

    Samarium Oxide Sm2O3 target Scandium Oxide Sc2O3 target

    Silicon Dioxide SiO2 target Silicon Monoxide SiO target

    Strontium Titanate SrTiO3 target Strontium Barium Titanate SrBaTiO3 target

    Strontium Ruthenate SrRuO3 target Barium Titanate BaTiO3 target

    Terbium Oxide Tb4O7 Target Tantalum Oxide Ta2O5, Ta2Ox target

    Titanium Oxide TiO, TiO2, Ti2O3, Ti3O5 target

    Thulium Oxide Tm2O3 target Tin Oxide SnO, SnO2 target

    Tungsten Oxide WO3, WO2.9 target Tungsten Lithium Oxide WO3-Li2O target

    Ytterbium Oxide Yb2O3 target Yttrium Oxide Y2O3 target

    Zircon Oxide ZrO2 target Zinc Oxide ZnO target

    Zirconium Oxide Yttria Stabilized ZrO2-Y2O3, YSZ target

    Calcium Oxide CaO target Cadmium Oxide CdO target

    Doped Boron Oxide taret ZnO-B2O3, ZrO2-B2O3 target

    Bismuth Oxide Bi2O3 target Bismuth Ferrite BiFeO3 target

    Vanadium Oxide V2O5, VO2 target Ruthenium Oxide RuO2 target

    Lead Oxide PbO target LaTiO3, SrTiO3-La, EuTiO3 target

    Yttrium Barium Copper Oxide YBCO taret Gadolinium Barium Copper Oxide, GdBaCuOx target

    LaMnO3 target, LaSrMnOx target Barium Oxide BaO target

    Lead zirconate titanate PbZrTiO3, PZT target Y3Fe5O12, YIG target


    We have only listed the more popular material. Please feel free contact us with any special requirements at any times, we will try to get back for you ASAP.


    China Aluminum oxide (Al2O3) sputtering target, evaporation material,CAS 1344-28-1 factory
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