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Tantalum pentoxide (Ta2O5) sputtering targets, thin film coating material, CAS 1314-61-0

Categories Sputtering Targets
Brand Name: TYR
Model Number: Ta2O5, Ta2Ox
Place of Origin: CHINA
MOQ: 1 piece
Price: USD$200 per piece
Payment Terms: T/T, Western Union
Supply Ability: 100 piece per month
Delivery Time: 10-30 work days
Packaging Details: vacuum packing with bag per piece
Material: Tantalum oxide
Color: gray, white
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    Tantalum pentoxide (Ta2O5) sputtering targets, thin film coating material, CAS 1314-61-0

    Tantalum oxide (Ta2O5, Ta2Ox) sputtering targets

    Purity: 99.99%

    Shape: Discs, disks, step disk, delta, plate, sheets or made per drawing

    Diameter: 355.6mm (14") max.

    Single piece Size: Length: <500mm, Width: <250mm, Thickness: >1mm, if larger size than this, we can do it as Tiles joint by 45 degree or 90 degree

    Made sputtering targets method: hot pressing (HP), hot/cold isostatic pressing (HIP, CIP), and vacuum melting, vacuum sintering

    Tantalum pentoxide, density: 8.20 g/cm3 ,melt point: 1872oC, white, odorless powder. It is a white solid that is insoluble in all solvents but is attacked by strong base and hydrofluoric acid. Both orthorhombic and hexagonal phases are known. Ta2O5 is a high refractive index, low absorption (i.e.colourless), inert material, which makes it useful for coatings.
    Tantalum pentoxide is a highly robust material, decomposing thermally above 1470 °C.

    Applications: electronics, high speed tools, DRAM capacitor, glass, chemicals, made for Tantalum metals, crystals, preparation of lithium tantalite single crystals, chemical processing e.t.c

    Owing to its high band gap of 3.7 eV, Ta2O5 has found a variety of uses in electronics. It is used to make capacitors in automotive electronics, cell phones, and pagers, electronic circuitry; thin-film components; and high-speed tools. In the 1990s, interest grew in the use of tantalum oxide as a high-k dielectric for DRAM capacitor applications. It is used in on-chip MIM capacitors for RF CMOS integrated circuits. Due to its high index of refraction, Ta2O5 has been utilized in the fabrication of the glass of many photographic lenses.

    Both low and high temperature polymorphs exist. The low temperature form is known as β-Ta2O5, and the high temperature form is known as α-Ta2O5. The transition point between these two forms has been reported as 1360 °C. The transition is slow but reversible. The structures of both polymorphs consist of chains built from octahedral and pentagonal bipyramidal polyhedra sharing opposite vertices. These chains are further joined by sharing edges.

    We also supply below oxie ceramic sputtering targets material:

    Aluminum Oxide Al2O3 target Aluminum Zinc Oxide Al2O3-ZnO Al-ZnO target

    Antimony Oxide Sb2O3 target Antimony Tin Oxide Sb2O3-SnO ATO target

    Chromium Oxide Cr2O3 target Copper Oxide CuO, Cu2O target

    Cerium Oxide CeO2 Target Cobalt Oxide target CoO, Co2O3, Co3O4 target

    Dysprosium Oxide Dy2O3 target Europium Oxide Eu2O3 target

    Erbium Oxide Er2O3 target Germanium Oxide GeO2 target

    Gadolinium Oxide Gd2O3 target Gallium Oxide Ga2O3 target

    Hafnium Oxide HfO2 target Hafnium Yttrium Oxide HfO2-Y2O3 target

    Holmium Oxide Ho2O3 target Iron Oxide Fe2O3, Fe3O4 target

    Indium Oxide In2O3 target Indium Zinc Oxide, In2O3-ZnO target

    Indium Zinc Gallium Oxide In2O3-ZnO-Ga2O3, IZGO target

    Indium Gallium Oxide In2O3-Ga2O3, IGO target

    Indium Tin Oxide In2O3-SnO2, ITO target Lanthanum Oxide La2O3 target

    Lutetium Oxide Lu2O3 target Magnesium Oxide MgO target

    Molybdenum Oxide MoO3 target Manganese Oxide MnO2,MnO target

    Nickel Oxide NiO target Niobium Oxide Nb2O5, Nb2Ox target

    Neodymium Oxide Nd2O3 target Praseodymium Oxide Pr6O11 target

    Samarium Oxide Sm2O3 target Scandium Oxide Sc2O3 target

    Silicon Dioxide SiO2 target Silicon Monoxide SiO target

    Strontium Titanate SrTiO3 target Strontium Barium Titanate SrBaTiO3 target

    Strontium Ruthenate SrRuO3 target Barium Titanate BaTiO3 target

    Terbium Oxide Tb4O7 Target Tantalum Oxide Ta2O5, Ta2Ox target

    Titanium Oxide TiO, TiO2, Ti2O3, Ti3O5 target

    Thulium Oxide Tm2O3 target Tin Oxide SnO, SnO2 target

    Tungsten Oxide WO3, WO2.9 target Tungsten Lithium Oxide WO3-Li2O target

    Ytterbium Oxide Yb2O3 target Yttrium Oxide Y2O3 target

    Zircon Oxide ZrO2 target Zinc Oxide ZnO target

    Zirconium Oxide Yttria Stabilized ZrO2-Y2O3, YSZ target

    Calcium Oxide CaO target Cadmium Oxide CdO target

    Doped Boron Oxide taret ZnO-B2O3, ZrO2-B2O3 target

    Bismuth Oxide Bi2O3 target Bismuth Ferrite BiFeO3 target

    Vanadium Oxide V2O5, VO2 target Ruthenium Oxide RuO2 target

    Lead Oxide PbO target LaTiO3, SrTiO3-La, EuTiO3 target

    Yttrium Barium Copper Oxide YBCO taret Gadolinium Barium Copper Oxide, GdBaCuOx target

    LaMnO3 target, LaSrMnOx target Barium Oxide BaO target

    Lead zirconate titanate PbZrTiO3, PZT target Y3Fe5O12, YIG target

    We have only listed the more popular material. Please feel free contact us with any special requirements at any times, we will try to get back for you ASAP.

    China Tantalum pentoxide (Ta2O5) sputtering targets, thin film coating material, CAS 1314-61-0 factory
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