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Hafnium oxide (HfO2) pellets use in evaporation or thin film coating material

Categories Sputtering Targets
Brand Name: TYR
Model Number: HfO2
Place of Origin: CHINA
MOQ: 0.1 kg
Supply Ability: 1000 kg
Packaging Details: bottle or bag
Color: white and black
Purity: 99.99%
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    Hafnium oxide (HfO2) pellets use in evaporation or thin film coating material

    Hafnium oxide (HfO2) thin film coating material

    Purity: 99.99%

    Shape: shots, pellets, pieces, granules, rods, tablets


    Shots: 3mm diameter, 6mm diameter e.t.c

    Pellets: 3mm dia. X 3mm L, 6mm dia. X 6mm L, 10mm dia. X 5mm L e.t.c

    Pieces, Granules: 1-2.5mm, 3-6mm, 3-8mm, 1-3mm, 3-12mm e.t.c

    Rods: 3mm diameter, 5mm diameter, 10mm diameter e.t.c

    Made sputtering targets method: hot pressing (HP), hot/cold isostatic pressing (HIP, CIP), and vacuum melting, vacuum sintering

    Molecular Weight: 210.49g/mol., Density: 9.68g/cm3, Melting Point: 2758°C, , Softening temp. : ~1100- 1500°C, Boiling Point : 5400°C, Bulk Density; 1922-2883 kg/m3, Solubility In Water, insoluble Appearance: white powder

    Hafnium oxide (HfO2) is the inorganic compound with the formula HfO2. Also known as hafnia, this colourless solid is one of the most common and stable compounds of hafnium. It is an electrical insulator with a band gap of approximately 6 eV. Hafnium dioxide is an intermediate in some processes that give hafnium metal.
    Hafnium oxide (HfO2) is quite inert. It reacts with strong acids such as concentrated sulfuric acid and with strong bases. It dissolves slowly in hydrofluoric acid to give fluorohafnate anions. At elevated temperatures, it reacts with chlorine in the presence of graphite or carbon tetrachloride to give hafnium tetrachloride.

    Hafnium oxide (HfO2) is a high-index, low absorption material, used in optical coatings, and as a high-k dielectric in DRAM capacitors, typical applications include near-UV laser AR and dielectric mirror designs. Hafnium-based oxides are currently leading candidates to replace silicon oxide as a gate insulator in field effect transistors. The advantage for transistors is its high dielectric constant: The dielectric constant of HfO2 is 15.6, whereas the dielectric constant of SiO2 is only 3.9.

    The compound appears to have been chosen by both IBM and Intel as a substrate for future integrated circuits, where it may help in the continuing effort to increase logic density and clock speeds, or to lower power consumption, in computer processors.
    Because of its very high melting point, hafnia is also used as a refractory material in the insulation of such devices as thermocouples, where it can operate at temperatures up to 2500 °C

    We also supply below material:

    Material NameFormulaPurityForm
    Aluminum OxideAl2O399.99%Ceramic, Crystal
    Gadolinium OxideGd2O3Gd2O3/TREO>99.99%, TREO>99%Ceramic
    Hafnium OxideHfO299.99%Ceramic
    Silicon OxideSiO99.9%Ceramic, Crystal
    Silicon DioxideSiO299.995%Ceramic, Crystal
    Titanium DioxideTiO299.99%Ceramic
    Titanium OxideTi2O399.99%Ceramic, Crystal
    Yttrium OxideYb2O3Yb2O3/TREO>99.99%, 99.999%; TREO>99%Ceramic
    Lanthanum Titanium OxideLaTiO399.99%Ceramic
    Zinc OxideZnO99.99%Ceramic
    Zirconium OxideZrO299.95%Ceramic
    Yttrium OxideY2O3Y2O3/TREO>99.99%, 99.999%; TREO>99%Ceramic
    Titanium OxideTi4O799.99%Ceramic
    Tin OxideSnO99.9%Ceramic
    Iron OxideFe2O399.9%Ceramic
    Strontium TitanateSrTiO399.9%Ceramic
    Cerium OxideCeO2CeO2/TREO>99.99%, 99.999%; TREO>99%Ceramic
    Indium Tin OxideITO99.99%Ceramic
    Magnesium OxideMgO99.9%Ceramic, Crystal
    Scandium OxideSc2O3Sc2O3/TREO>99.9%, 99.99%; TREO>99%Ceramic
    Titanium OxideTiO99.99%Ceramic
    Trititanium pentoxideTi3O599.99%Ceramic, Crystal
    Tantalum PentoxideTa2O599.99%Ceramic
    Zirconium Titanium OxideZrO2-TiO299.9%Ceramic
    Praseodymium TitanatePrTiO399.9%Ceramic
    Zirconium Magnesium OxideZrO2-MgO99.99%Ceramic
    Zirconium Tantalum OxideZrO2-Ta2O599.99%Ceramic
    Niobium PentoxideNb2O599.99%Ceramic
    Zirconium OxideZrO99.9%Ceramic
    Tin OxideSnO299.9%Ceramic
    Barium TitanateBaTiO399.9%Ceramic

    China Hafnium oxide (HfO2) pellets use in evaporation or thin film coating material factory
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